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    ?JC系列磁控溅射镀膜机
    • 用途及特点
    • 规格参数
      JC系列用途及特点
      Use and Features
       
      ●磁控溅射镀膜设备主要用于在基片上镀制金属、半导体、电介质、多元素化合物或混和物。利用溅射法可制备金属膜、半导体膜、绝缘膜、硬质膜、耐热膜、耐腐蚀膜、超导膜、磁性膜、光学膜等各种特殊性能的薄膜。
      ●基片尺寸适应范围广,可镀制多种材料,工艺可控性好、灵活性强、重复性高、基片温升小、膜层附着力强,计算机全自动控制,******性高。且安装维护方便,占地位置小。
      JC系列磁控溅射镀膜机
      Series JC Magnetron Sputtering Coater
       
      主要机型及参数
      Main models and parameters
      型号
      Model
      应用特点
      Application field
      装片工作台特点
      Features of film loading bench
      基片尺寸
      Size of substrate
      产量/每小时
      1μ铝层厚度
      Output per hour 1μm aluminum coating thickness
      厚度
      均匀性
      thickness homogeneity
      真空系统
      Vacuum system
      JC400-1/D 适合科研、生产硅片及砷化镓片
      Scientific research,production of silicon film and gallium arsenide film
      全自动盒对盒送片,溅射源数量可按工艺调整,低尘粒
      Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles
      4~6″ 40 ±5% 低温泵加
      分子泵系统
      Cryogenic pump system added with molecular pump
      JC500-1/D 适用于圆形片状工件
      Circular sheet work-piece
      工件可进行公转,水平装片
      Revolution of work-piece available;horizontal film loading
      4″ 16 ±8% 分子泵系统
      Turbomolecular pump system
      JC500-5/D 适用于矩形片状工件
      Rectangular sheet work-piecevv
      工件可进行公转,垂直装片
      Revolution of work-piece available;vertical film loading
      150x150mm 10 ±8% 分子泵系统
      Turbomolecular pump system
      JC600-1/D 适用于矩形片状工件
      Rectangular sheet work-piecevv
      工件架为十边拄形,垂直装片
      work-piece holder in decagonal column shape;vertical film loading
      280x100mm 20 ±8% 扩散泵系统
      Diffusion pump system
      JC600-2/D 适合科研、生产砷化镓基片线宽亚微米级
      Scientific research,production of gallium arsenide film with line width at submicron level
      工件可进行自传、公转
      水平装片
      Rotation and revolution of work-piece available;horizontal film loading
      3″ 24 ±5% 低温泵系统
      Cryogenic pump system
      JC650-1/D 适用于矩形或圆形片状工件
      Rectangular or circular sheet work-piece
      工件可进行公转,水平装片
      revolution of work-piece available;horizontal film loading
      Φ100mm 10 ±5% 分子泵系统
      Turbomolecular pump system
       

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